File:'Little Wave', wood, epoxy resin, aniline dye, metal and oil-based lithography ink work by John Cederquist (American born 1946), 1990-1991, Metropolitan Museum of Art.jpg

Little Wave, wood, epoxy resin, aniline dye, metal and oil-based lithography ink work by John Cederquist, 1990-1991, Metropolitan Museum of Art

Fair use in John Cederquist
Though this image is subject to copyright, its use is covered by the U.S. fair use laws because:
 * 1) This is a historically significant work that could not be conveyed in words.
 * 2) Inclusion is for information, education, and analysis only.
 * 3) Its inclusion in the article(s) adds significantly to the article(s) because it shows a major type of work produced by the artist.
 * 4) The image is a low resolution copy of the original work and would be unlikely to impact sales of prints or be usable as a desktop backdrop.
 * 5) It is not replaceable with an uncopyrighted or freely copyrighted image of comparable educational value.

Photographer's contributions to this image are released to the public domain.