User:Ewfwiki/sandbox

Base Piranha Solution
Base Piranha Solution, also known as RC1, is an etching solution used primarily in the semiconductor manufacturing industry. It is highly reactive with organic material. It is a mixture of ammonium hydroxide, hydrogen peroxide and water. The term "Base" is the chemistry term for solutions with pH greater than 7 and reflects the fact that the solution contains ammonium hydroxide, a base. It differentiates the solution from other hydrogen peroxide in water solutions containing acid, those are termed Prianha Solutions or Acid Piranha Solutions. The term "Piranha" is a metaphore for the high reactivity of the solution with organic material, equating the dissolution of organic material in the solution to the rapid eating of flesh by carniverous fish. The term "RC1" is an acronym for Recommended Cleaning 1, refering to the solution developed by the Radio Corporation of America in 1964.

---Example of Wikipedia References ---Source

Piranha solution should always be prepared by adding hydrogen peroxide to sulfuric acid slowly, never in reverse.

Mixing the solution is extremely exothermic. If the solution is made rapidly, it will instantly boil, releasing large amounts of corrosive fumes.

Once the mixture has stabilized, it can be further heated to sustain its reactivity.

The hot (often bubbling) solution cleans organic compounds off substrates and oxidizes or hydroxylates most metal surfaces.