User:Reimarspohr/Temp/Ion Track Technology/Characteristics

Task of ion track technology
Ion track technology can fill a niche where conventional microtechnology fails:
 * Mask-less structuring is possible with random pattern governed by probability.
 * The technique is applicable to radiation resistant minerals, glasses and polymers.
 * The resolution limit of the structuring technique is smaller than 8 nanometers.
 * Thin polymer films can be structured directly without any development process.
 * Structural depth can be defined either by the film thickness or by the ion range.
 * Aspect ratios depend on material and processing and range between 1 and 104.
 * For narrow tracks it is possible to shape materials at defined cutting angle.
 * The angle of incidence offers two new degrees of freedom in shaping materials.