User:Vrvummadi/sandbox

Dr. Vummadi Venkat Reddy Young Scientist(DST) C/o Prof. S. Satyanarayana Vice-chancellor Professor, Department of Chemistry, Osmania University,Hyderabad-500007, INDIA. E-mail address : vvreddyiict@gmail.com ; vvreddyou@gmail.com

Objective:

To pursue an academic and scientific research position in your esteemed organization that would further enrich my experience and creativity in Synthetic Organic/Material Chemistry, Nanotechnology & Photochemistry.

Summary:

•Over 12+ year’s experience in Scientific & Industrial Research Organizations. •Good exposure in Synthetic Organic Chemistry, Nanotechnology & Photolithography. •Familiar with analytical instruments (NMR, SEM, AFM, HPLC, GC, GC-MS, UV, FT-IR etc.). •Capable to interpretation of analytical results obtained from various analytical instruments. •Trained on Technology Led Entrepreneurship.

Education:

•Fast Track Young Scientist Award from Department of Science and Technology (DST) Working as a Young Scientist at Department of Chemistry, Osmania University, Hyderabad, India. •Worked as a Postdoctoral Associate at Massachusetts Institute of Technology (MIT), Cambridge, Massachusetts (MA), USA. •Worked as a Postdoctoral Research Associate at The University of North Carolina at Charlotte, North Carolina, USA. •Ph.D. Synthetic Organic Chemistry, Nanotechnology & Photochemistry Indian Institute of Chemical Technology (IICT), Hyderabad, India. Thesis Title: “Design and synthesis of novel organic photo imaging compounds and   their lithographic applications” •Research Advisor: Dr. V. Jayathirtha Rao, Deputy Director, Organic Chemistry Division at Indian Institute of Chemical Technology, Hyderabad, India. •Fourth Training Programme on TECHNOLOGY LED ENTREPRENEURSHIP conducted by HRDG-CSIR & IIM, Bangalore at CLRI Chennai. •M.Sc. Organic Chemistry, Osmania University, Hyderabad, India. •B.Sc. Chemistry & Biology, Osmania University, Hyderabad, India.

Accomplishments of Research Institutions and companies (visited):

•Massachusetts Institute of Technology (MIT), Cambridge, USA. •The University of North Carolina, USA. •University of Wisconsin-Madison (SRC-Center), USA. •Indian Institute of Chemical Technology (IICT), Hyderabad, India. •Osmania University (OU), Hyderabad, India. •National Chemical Laboratory (NCL), Pune, India. •Solid State Physics Laboratory (SSPL)-Delhi, India. •Central Electronics Engineering Research Institute (CEERI), Pilani, India. •Gallium Arsenide Enabling Technology Centre (GAETEC), India. •Bhabha Atomic Research Centre (BARC), Mumbai, India. •Indian Institute of Technology Kanpur (IITK), India. •Indian Institute of Technology Madras (IITM), India. •Indian Institute of Science, Bangalore (IISc), India. •University of Hyderabad, India. •Homi Bhabha Centre for Science Education, (TIFR)-Mumbai, India. •Central Leather Research Institute (CLRI) Chennai, India

ACHIEVEMENT:

An International Publishers know as Lambert Academic Publishing (LAP) GmbH & Co. KG, Germany have published my doctoral research work entitled “DESIGN AND SYNTHESIS OF NOVEL ORGANIC PHOTO IMAGING COMPOUNDS AND THEIR LITHOGRAPHIC APPLICATIONS” in the form of book for an academic research. It is great honor and good achievement.

Fellowships and Awards:

•Fast Track Young Scientist award from Department of Science and Technology (DST),New Delhi. •Postdoctoral Associate, ChemE, MIT, Cambridge, MA, USA. •Postdoctoral Research Associate, UNC Charlotte, North Carolina, USA •Senior Research Fellowship (SRF) from Council of Scientific and Industrial Research (SRF-CSIR) •Junior Research Fellowship (JRF) from Ministry of Information Technology (MIT) New Delhi. •National Eligibility Test (NET) from Council of Scientific and Industrial Research (NET-CSIR) •Qualified I.I.Sc. –Bangalore Ph.D Entrance Test & Interview.

Training Programme (HRDG-CSIR&IIM):

Fourth Training Programme on TECHNOLOGY LED ENTREPRENEURSHIP conducted by HRDG-CSIR & IIM, Bangalore at CLRI Chennai. (Feb- March 2007)

Computer and Software Skills:

Sci-Finder, Patents Search, MS Word, Power Point, Chem. Draw, ACD Labs, ISIS draw, preparation of research reports, manuscripts and drafting patents.

Professional Competence:

•Design and synthesis of novel photoacid generators and polymer resist for EUV Lithography at 13.5nm wavelength with 22nm line/space. Grafted polymers, polymer phenolic acetyl derivatives and cyclic photoacid generators •Synthesis of Organic Molecules by different methods in Organic Synthesis. •Design and synthesis of bioactive molecules and light sensitive compounds. •Expertise in handling of air-sensitive and dry condition reactions. •Development of new synthetic methodologies. •Synthesis of RNA Amidites and Synthesis of Peptides, Amino acid derivatives. •Capable of carrying independent and collaborative research. •Expertise in handling both small-scale and large-scale reactions, complex purification methods. •Identify experimental problems and resolve them independently. •Structure elucidation based on 1H-NMR, 13C-NMR, Mass and IR spectroscopic techniques. •Experience in working and analysis with analytical instruments such as NMR, GC,GC-MS, IR, HPLC, LC-MS, DSC, GPC, TGA, Fluorimetry and UV-Visible. •Writing manuscripts, drafting patents and scientific reports. •Maintain good interpersonal relationships.

Accomplishments in Doctoral Research: 2001- 2006 November: Ph.D. Research Fellow in the field of Synthetic Organic Chemistry & Nanotechnology at Indian Institute of Chemical Technology, Hyderabad, India.

During the course of my Ph. D work I have carried out the Synthesis of triazolin derivatives, diazonaphthoquinonesulfonic acid bisphenol derivatives, triphenyl sulfonium salts (Grignard reagents), bisazides, Polyvinylcinnamate, Napthyldiene derivatives, anthraceneacrylic esters (Horner-Wadsworth-Emmons (HWE) condensation) and anthryldiene derivatives.

An innovative process has been developed for the preparation of diazonaphthoquinonesulfonyl chloride using diazonaphthoquinonesulfonic acid or sodium salt, diphosgene and triphosgene. The novelty and the advantages of this process are enviro friendly process, low temperatures and simple workup procedure with excellent yields. A process patent has been approved world wide. (US, EP, JP & INDIA)

An innovative and a single pot process have been developed for the preparation of diazonaphthoquinonesulfonyl esters. The process consists of diazonaphthoquinonesulfonic acid or its sodium salt, diphosgene/triphosgene and phenol were taken a single pot at low temperatures. The novelty and the advantages of this process are eco friendly process and simple workup procedure with excellent yields. A process patent has been approved world wide. (US, EP, JP, PCT & INDIA)

Various bisphenols have been synthesized using phenol and different types of ketones in the presence of dry hydrochloride gas with excellent yields. Thus prepared bisphenols were used for the preparation of novel diazonaphthoquinonesulfonic acid bisphenol derivatives and studied their lithographic evaluations. A process patent has been approved world wide. (US, EP, JP, PCT & INDIA)

Synthesized new photoacid generators such as triphenyl sulfonium salts and substituted triphenyl sulfonium salts using Grignard reagents. Thus synthesized triphenyl sulfonium salts, SU-8 resin & Lapox resins were used in negative photoresist for lithographic application. Reverse engineering analysis of the photoresist materials.

Projects Handled:

•As a Postdoctoral Associate, Department of Chemical Engineering, Massachusetts Institute of Technology(MIT), Cambridge, MA, USA. NIH project has been taken up for development of microfluidic technologies for reaction discovery methodology development and library synthesis.

•As a Postdoctoral Research Associate, UNC Charlotte, North Carolina, USA NSF project has been taken up for Design, Synthesis and Evaluation of photoacid generators. Which are very essential to make chemical libraries for nanotechnology applications.

•Parallel to my Ph. D. work, I have actively participated MIT-DELHI project, process development for the preparation of diazonaphthoquinonesulfonic acid & their derivatives. Which are very essential to make chemical libraries. •DuPont project has been taken up for the synthesis of various triazolin derivatives. Which are important biologically active compounds. •KANSAI-JAPAN project has been taken up for Design, Synthesis and Evaluation of photoacid generators. Which are very essential to make chemical libraries.

Patents:

US Patents:

25) Single Pot Process for the Preparation of Diazonaphthoquinonesulfonyl Ester

Vummadi Venkat Reddy et al. US Patent Publication Number: US7355021B2, Publication Date: 08-04-2008

24) NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. US Publication Number: US20100081084A1 Publication Date: 01-04-2010

23) Single Pot Process for the Preparation of Diazonaphthoquinonesulfonyl Ester

Vummadi Venkat Reddy et al. US Patent Publication Number: US20070049742A1, Publication Date: 01-03-2007

22) Process for the preparation of diazonaphthoquinonesulfonylchlorides using diphosgene and triphosgene Vummadi Venkat Reddy et al. US Patent Publication Number: US6559291B1, Publication Date: 06-05-2003

European Patents:

21) A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHO QUINONESULFONYL ESTER

Vummadi Venkat Reddy et al. European Patent Publication number: EP1928819B1, Publication Date: 06-04-2011

20) A process for the preparation of diazonaphthoquinonesulfonylchlorides using diphosgene and triphosgene Vummadi Venkat Reddy et al. European Patent Publication Number: EP1348693B1 Publication Date: 12-09-2007

19) NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. European Patent Publication Number: EP2137140B1 Publication Date: 10-11-2010

18) A process for the preparation of diazonaphthoquinonesulfonylchlorides using diphosgene and triphosgene

Vummadi Venkat Reddy et al. European Patent Publication Number: EP1348693A1 Publication Date: 01-10-2003

Japanese Patents:

17) Novel Diazonaphthoquinonesulfonic Acid Bisphenol Derivative Useful In Photo Lithographic Sub Micron Patterning and A Process For Preparation Thereof

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. Japanese Patent Publication Number: JP2010522230A Publication Date: 02-07-2010

16) PROCESS FOR PREPARING DIAZONAPHTHOQUINONESULFONYL CHLORIDE USING DIPHOSGENE AND TRIPHOSGENE

Vummadi Venkat Reddy et al. Japanese Patent Publication Number: JP4159022B2 Publication Date: 01-10-2008

15) Single Pot Process For The Preparation Of Diazonaphthoquinonesulfonyl Ester

Vummadi Venkat Reddy et al. Japanese Patent Publication Number: JP2009507013A Publication Date: 19-02-2009

14) Process for Preparing Diazonaphthoquinonesulfonyl Chloride Using Diphosgene And Triphosgene

Vummadi Venkat Reddy et al. Japanese Patent Publication Number: JP2003292479A Publication Date: 15-10-2003

Austrian Patents:

13) Single Pot Process for the Preparation of Diazonaphthoquinonesulfonyl Ester

Vummadi Venkat Reddy et al. Austrian Patent Publication Number: AT504563T Publication Date: 15-04-2011

12) NOVEL DIAZONAPHTHOQUINONESULFONIC ACID BISPHENOL DERIVATIVE USEFUL IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING AND A PROCESS FOR PREPARATION THEREOF Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. Austrian Patent Publication Number: AT487695T Publication Date: 15-11-2010

Worldwide Patents:

11) Novel Diazonaphthoquinonesulfonic Acid Bisphenol Derivative Useful In Photo Lithographic Sub Micron Patterning and A Process For Preparation Thereof

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. World Patent Publication Number: WO2008117308A2 Publication Date: 02-10-2008

10) Single Pot Process for the Preparation of Diazonaphthoquinonesulfonyl Ester

Vummadi Venkat Reddy et al. Spain Patent Publication Number: ES2368231T3 Publication Date: 15-11-2011

9) Novel Diazonaphthoquinonesulfonic Acid Bisphenol Derivative Useful In Photo Lithographic Sub Micron Patterning and a Process For Preparation Thereof

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. World Patent Publication Number: WO2008117308A3 Publication Date: 02-10-2008

8) A process for the preparation of diazonaphthoquinonesulfonylchlorides using diphosgene and triphosgene

Vummadi Venkat Reddy et al. Germany Patent Publication Number: DE60222376T2 Publication Date: 29-05-2008

7)Novel Diazonaphthoquinonesulfonic Acid Bisphenol Derivative Useful In Photo Lithographic Sub Micron Patterning and a Process for Preparation Thereof

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. World Patent Publication Number: WO2008117308A4 Publication Date: 02-10-2008

6) A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHO QUINONESULFONYL ESTER

Vummadi Venkat Reddy et al. World Patent Publication Number: WO2007026374A1 Publication Date: 08-03-2007

5) A process for preparation of new diazonaphthoquinonesulfonic acid bisphenol derivatives and their use in photolithographic sub micron patterning

Vummadi Venkat Reddy, V. Jayathirtha Rao, M. Lakshmi Kantam, S. Sakunthala Madhavendra & V. K. Dwivedi. Patent filed World Wide-2006 CSIR-IICT. File no. PT-503/2006. NF-198/06.

Indian Patents:

4) A PROCESS FOR PREPARATION OF NEW DIAZONAPHTHOQUINONE SULFONIC ACID BISPHENOL DERIVATIVES AND THEIR USE IN PHOTO LITHOGRAPHIC SUB MICRON PATTERNING

VUMMADI VENKAT REDDY, VAIDYA JAYATHIRTHA RAO, MANNEPALLI LAKSHMI KANTAM, SUNKARA SAKUNTHALA MADHAVENDRA, VIRENDRA KUMAR DWIVEDI Indian Patent Application Number: 649/DEL/2007 Publication Date: 10/02/2012 (Journal Number: 06/2012)

3) A PROCESS FOR THE PREPERATION OF DIAZONAPHTHOQUINONE SULFONYLCHLORIDES USING DIPHOSGENE AND TRIPHOSGENE

VUMMADI VENKAT REDDY ET AL. Indian Patent Number: IN233481 Date of Publication of Granted Patent: 27/03/2009 (Journal Number: 14/2009)

2) A SINGLE POT PROCESS FOR THE PREPARATION OF DIAZONAPHTHO QUINONESLFONYL ESTER

VUMMADI VENKAT REDDY ET AL. Indian Patent Application Number: 2339/DEL/2005 Publication Date: 31/07/2009 (Journal Number: 31/2009)

1) A NEW PROCESS FOR THE PREPERATION OF DIAZONAPHTHOQUINONE SULFONYLCHLORIDES USING DIPHOSGENE AND TRIPHOSGENE

VUMMADI VENKAT REDDY ET AL. Indian Patent Application Number: 413/DEL/2002 Publication Date: 27/04/2007 (Journal Number: 17/2007)

Presentation in Symposiums/Seminars:'

5) Fluorinated Anionic Photoacid Generators (PAGs) & Super PAG Bound Polymer Resists for Nanolithography

K. E. Gonsalves, M. Wang, V. R. Vummadi and M. M. Rabinovich Polymer Nanotechnology Laboratory at Center for Optoelectronic and Optical Communications & Department of Chemistry, University of North Carolina, Charlotte, North Carolina 28223, USA 11th International Conference on Advanced Materials Rio de Janeiro – RJ, Brazil, September 20 - 25, 2009

4) 2nd INTERNATIONAL CONFERENCE on Organic Synthesis and Process Chemistry (OSPC-2005) April 1-3, 2005, Indian Institute of Chemical Technology, Hyderabad, India.

3) Photochemistry of Diazonaphthoquinone Esters in Zeolitic Environment.      V. Venkat Reddy & V. Jayathirtha Rao* Trombay Symposium on Radiation and Photochemistry (TSRP-2004); January 8-12, 2004, Bhabha Atomic Research Centre (BARC), Mumbai, India.

2) Indian Society for Radiation & Photochemical Sciences (ISRAPS); WORKSHOP ON RADIATION & PHOTOCHEMISTRY; Homi Bhabha Centre for Science Education, January 5-7, 2004, Mumbai, India.

1) Photoresist Materials: Synthesis and Photochemistry,

V. Venkat Reddy et al. National Symposium on Radiation & Photochemistry (NSRP-2003); March 3-5, 2003, IIT Kanpur, India.