User talk:Yermih/Old SELA page

SELA is an engineering and failure analysis equipment provider for the semiconductor industry. SELA has headquarters in Israel and a subsidiary in Santa Clara.

SELA develops unique solutions used by semiconductor manufacturers to prepare wafer samples for Scanning Electron Microscope (SEM) and Transmission Electron Microscopy (TEM).

Distributors are located in Korea, Japan, Singapore, Taiwan, France, Germany, United Kingdom, Malaysia, and China.

As failure analysis, defect detection and process monitoring become paramount in semiconductor fabs, global interest increases for sample preparation tool; DRAM, flash memory and logic fabs process samples.

Gentle broad ion milling has traditionally been an accepted method of material removal to obtain samples of high quality with negligible artifacts. However, this technique could not be applied effectively for sample preparation because it could not fulfill the essential requirements of precision and productivity. It was therefore relegated to the function of FIB touch-up, or completion of mechanically polished lamella or preparation of non site-specific specimens where throughput was not an issue.

SELA was ideally positioned to overcome these drawbacks. It has established itself as the pre-eminent supplier of sample preparation solutions; its MicrocleavingTM technology has set the standard for precision high quality SEM sample preparation, and its EM2 system with the cryo-cooled dry saw technology has enhanced the productivity of TEM sample pre-preparation. This latter innovation was viewed at SELA as a precursor to a full TEM sample preparation solution that would overcome the limitations of FIB and other preparation techniques.

SELA released the Xact, the first TEM sample preparation system using the disruptive new AIM - Adaptive Ion Milling technology. Delivering excellent sample quality, significantly reduced turnaround times and enhanced productivity, SELA's newest system in its suite of sample preparation tools introduces a twin-beam solution uniquely configured for artifact-free sample clarity and precise end-point detection.